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Photomask Cleaning Solution

Photomask Cleaning Solution: This cleaning solution is for re-cleaning both emulsion, chrome and iron oxide masks. Use it full strength for hard surface masks, and dilute 8:1 with filtered DI water for use in cleaning high resolution emulsion photomasks. This cleaning solution does not dissolve photoresist. For chrome and iron oxide masks with resist contamination it is recommended to restrip the mask prior to cleaning. Cleaning will remove most other organic contaminants.