August 11, 2003

NEW PRODUCT RELEASE
August 11,2003 - PPD-455 High Speed Positive Photoresist Developer
PPD-455 Positive Photoresist Developer has been designed to maximize the photo speed of the resist with most positive resists using UV exposure systems. PPD-455 has shortened exposure times for most photo systems by 33%. This means a three hour pattern generation job, will now only require two hours. This improvement in speed provides great value in through-put to the mask maker, while maintaining sub-micron resolution in the resist. MTI recommends making an exposure series test on three plates.

This process is as follows:
Plate One: develop at room temp. for 30 seconds.
Plate Two: develop at room temp. for 45 seconds.
Plate Three: develop at room temp. for 60 seconds.
Choose the process vs. exposure combination with minimal stripping and minimal exposure time to suit your needs. The process may be pushed further with slight stripping of the unexposed resist but may not affect resolution or image quality.