Microchrome Technology

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Products

Negative and Reversal Process
Chemistry

Emulsion Negative
           Process Sheet
           Reversal Emulsion Process

Hard Surface Process Chemistry

Positive Process Sheet

Ultra High Quality Photoplates

High Resolution Film

Chrome Photoplate Positive Process Sheet

Step	Time (In Seconds)	Description
1)	--	Expose photoplate. Determine exposure empirically.
2)	45	PPD-450 Developer. Develop with gentle agitation at room temp. (70°F +/- 1°F). Develop in tank, spray or tray mode.
3)	60	Rinse with filtered DI water using immersion or spray.
4)	30 - ?	CEP-200 Etchant. Etch at room temp. (70°F +/- 1°F). Different manufacturers have different thickness and quality of chrome layers. Determine empirically the first etching times. (Normal etch rate is 33Å chrome/sec). Etch typically to clear time plus 10% over etch.
5)	60	Rinse with filtered DI water using immersion or spray.
6)	5 minutes	PRS-100 Stripper. Strip photoresist at room temp. with agitation.
7)	2 minutes	Wash in filtered DI water followed with a forceful spray.
8)	Dry	Spin dry

Determine exposure empirically to visually clear the image in 30-45 seconds. Then over-develop beyond the visually clear time by 15% of develop time. This will clean up any traces of non-visual photoresist on the plate.

NOTE:

Use PCS-605 Photomask Cleaning Solution to reclean masks after handling.